Bessergenev, V.Pereira, R. J. F.Mateus, M. C.Khmelinskii, IgorNicula, R. C.Burkel, E.2018-12-072018-12-0720031110-662XAUT: VBE01263; IKH00165;http://hdl.handle.net/10400.1/12139Photocatalytic TiO2 films on glass and quartz plates were obtained by the chemical vapour deposition using Ti(dpm)(2)(Opr(i))(2) complex compound (CC-CVD method) in a standard vacuum apparatus at 1.2-2.0 x 10(-4) mbar. The substrate temperature was stabilised in the range of 450-600 degreesC. The growth rate varied from several nanometres to several dozen of nanometres per minute. Structural information on TiO2 thin films was obtained from synchrotron radiation experiments. High-resolution grazing incidence X-ray diffraction (GIXRD) experiments were performed at the high-resolution powder diffractometer at the DESY/HASYLAB beamline B2 (Hamburg, Germany). Thin films deposited on either single-crystal Si wafers or on amorphous quartz substrates were analysed. The photocatalytic activity of the TiO2 thin films was studied using a photocatalytic reactor. The fungicide Fenarimol was chosen as chemical indicator and its degradation kinetics was followed by High-Performance Liquid Chromatography (HPLC).engChemical-vapor-depositionTitanium-dioxideSr)Tio3 filmsAdsorptionTio2(110)WaterDegradationSurfaceH2OBajournal articlehttp://dx.doi.org/10.1155/S1110662X03000205