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Controlling the crack formation in inkjet-printed silver nanoparticle thin-films for high resolution patterning using intense pulsed light treatment

2017-12Journal article Restricted access
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dc.contributor.authorGokhale, Pritesh
dc.contributor.authorMitra, Dana
dc.contributor.authorSowade, Enrico
dc.contributor.authorMitra, Kalyan Yoti
dc.contributor.authorGomes, Henrique L.
dc.contributor.authorRamon, Eloi
dc.contributor.authorAl-Hamry, Ammar
dc.contributor.authorKanoun, Olfa
dc.contributor.authorBaumann, Reinhard R.
dc.date.accessioned2019-11-20T15:07:08Z
dc.date.available2019-11-20T15:07:08Z
dc.date.issued2017-12
dc.description.abstractDuring the last years, intense pulsed light (IPL) processing has been employed and studied intensively for the drying and sintering of metal nanoparticle layers deposited by means of printing methods on flexible polymer substrates. IPL was found to be a very fast and substrate-gentle approach qualified for the field of flexible and large-area printed electronics, i.e. manufactured via roll-to-roll processing. In this contribution, IPL is used for the fine-patterning of printed silver nanoparticle layers. The patterning is obtained by induced and controlled crack formation in the thin silver layer due to the intense exposure of IPL. The crack formation is controlled by selection of the substrate material, the fine-tuning of the morphology of the silver layer and an application of a dielectric layer on top of the silver layer that acts as a stress concentrator. Careful optimization of the IPL parameters allowed to adjust the lateral width of the crack. This novel approach turned out to be a fast and reproducible high-resolution patterning process for multiple applications, e.g. to pattern the source-drain electrodes for all-inkjet-printed thin-film transistors.
dc.description.sponsorshipEU project TDK4PE [287682]
dc.description.sponsorshipFederal Cluster of Excellence MERGE - German Research Foundation (DFG) [EXC1075]
dc.identifier.doi10.1088/1361-6528/aa9238
dc.identifier.issn0957-4484
dc.identifier.issn1361-6528
dc.identifier.urihttp://hdl.handle.net/10400.1/12900
dc.language.isoeng
dc.peerreviewedyes
dc.publisherIop Publishing Ltd
dc.relationTechnology & Design Kits for Printed-Electronics
dc.subjectElectronics
dc.subjectOxide
dc.subjectTransistors
dc.titleControlling the crack formation in inkjet-printed silver nanoparticle thin-films for high resolution patterning using intense pulsed light treatment
dc.typejournal article
dspace.entity.typePublication
oaire.awardTitleTechnology & Design Kits for Printed-Electronics
oaire.awardURIinfo:eu-repo/grantAgreement/EC/FP7/287682/EU
oaire.citation.issue49
oaire.citation.startPage495301
oaire.citation.titleNanotechnology
oaire.citation.volume28
oaire.fundingStreamFP7
person.familyNameGomes
person.givenNameHenrique Leonel
person.identifier.orcid0000-0003-3664-4740
person.identifier.scopus-author-id7005305880
project.funder.identifierhttp://doi.org/10.13039/501100008530
project.funder.nameEuropean Commission
rcaap.rightsrestrictedAccess
rcaap.typearticle
relation.isAuthorOfPublication6da677b9-927f-423d-8657-448a0dccb67c
relation.isAuthorOfPublication.latestForDiscovery6da677b9-927f-423d-8657-448a0dccb67c
relation.isProjectOfPublication3f0de4d5-6c1d-4992-99dd-bd4796623d80
relation.isProjectOfPublication.latestForDiscovery3f0de4d5-6c1d-4992-99dd-bd4796623d80

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