Utilize este identificador para referenciar este registo: http://hdl.handle.net/10400.1/6568
Título: Surface photochemistry of pesticides: an approach using diffuse reflectance and chromatography techniques
Autor: Silva, José P. da
Ferreira, Luís F. Vieira
Data: 2004
Editora: American Chemical Society
Resumo: The photochemistry of pesticides triadimenol and triadimefon was studied on cellulose and beta-cyclodextrin (beta-CD) in controlled and natural conditions, using diffuse reflectance techniques and chromatographic analysis. The photochemistry of triadimenol occurs from the chlorophenoxyl moiety, while the photodegradation of triadimefon also involves the carbonyl group. The formation of 4-chlorophenoxyl radical is one of the major reaction pathways for both pesticides and leads to 4-chlorophenol. Triadimenol also undergoes photooxidation and dechlorination, leading to triadimefon and dechlorinated triadimenol, respectively. The other main reaction process of triadimefon involves alpha-cleavage from the carbonyl group, leading to decarbonylated compounds. Triadimenol undergoes photodegradation at 254 nm but was found to be stable at 313 nm, while triadimefon degradates in both conditions. Both pesticides undergo photochemical decomposition under solar radiation, being the initial degradation of rate per unit area of triadimefon 1 order of magnitude higher than the observed for triadimenol in both supports. The degradation rates of the pesticides were somewhat lower in beta-CD than on cellulose. Photoproduct distribution of triadimenol and triadimefon is similar for the different irradiation conditions, indicating an intramolecular energy transfer from the chlorophenoxyl moiety to the carbonyl group in the latter pesticide.
Peer review: yes
URI: http://hdl.handle.net/10400.1/6568
DOI: https://dx.doi.org/10.1021/es0348501
ISSN: 0013-936X
Aparece nas colecções:FCT2-Artigos (em revistas ou actas indexadas)

FacebookTwitterDeliciousLinkedInDiggGoogle BookmarksMySpace
Formato BibTex MendeleyEndnote 

Todos os registos no repositório estão protegidos por leis de copyright, com todos os direitos reservados.