Publication
Photochemistry of benzophenone adsorbed on MCM-41 surface
| dc.contributor.author | Silva, José P. da | |
| dc.contributor.author | Machado, I. F. | |
| dc.contributor.author | Lourenço, J. P. | |
| dc.contributor.author | Ferreira, Luís F. Vieira | |
| dc.date.accessioned | 2013-01-07T14:39:23Z | |
| dc.date.available | 2013-01-07T14:39:23Z | |
| dc.date.issued | 2005 | |
| dc.date.updated | 2013-01-03T10:24:51Z | |
| dc.description.abstract | The photochemistry of benzophenone adsorbed on a channel-type solid support MCM-41 was studied by the use of diffuse reflectance and chromatographic techniques. For comparison purposes parallel studies were also conducted on silicalite and H-ZSM-5. The observed ground state absorption, luminescence and transient absorption spectra and photoproduct distribution strongly depend on the substrate under study. Triplet state luminescence was observed in all solids, hydrogen-bonded excited benzophenone emission was detected on MCM-41 while protonated excited benzophenone luminescence was observed only on H-ZSM-5. Transient absorption showed the triplet state in all solids and formation of the OH benzophenone adduct on MCM-41 and H-ZSM-5. Ketyl radical formation occurs after 355 nm irradiation but is a minor degradation pathway. The formation of transients resulting from the reaction of benzophenone with molecular oxygen was also detected on MCM-41, in air-equilibrated conditions and benzoic acid is the main degradation product. 2-Hydroxybenzophenone is one of the major photodegradation products on MCM-41 and H-ZSM-5. Products resulting from the a-cleavage were also detected under 266 nm irradiation. Benzophenone was found to be very stable in silicalite under all used conditions. | por |
| dc.identifier.citation | Da Silva, J. P.; Machado, I. F.; Lourenço, J. P.; Ferreira, L. F. V. Photochemistry of benzophenone adsorbed on MCM-41 surface, Microporous and Mesoporous Materials, 84, 1-10, 2005. | por |
| dc.identifier.issn | 1387-1811 | |
| dc.identifier.other | AUT: JLO01215; | |
| dc.identifier.uri | http://hdl.handle.net/10400.1/2064 | |
| dc.language.iso | eng | por |
| dc.peerreviewed | yes | por |
| dc.publisher | Elsevier | por |
| dc.subject | Surface photochemistry | por |
| dc.subject | Diffuse reflectance | por |
| dc.subject | Luminescence | por |
| dc.subject | Laser flash photolysis | por |
| dc.subject | Degradation Products | por |
| dc.title | Photochemistry of benzophenone adsorbed on MCM-41 surface | por |
| dc.type | journal article | |
| dspace.entity.type | Publication | |
| oaire.citation.endPage | 10 | por |
| oaire.citation.startPage | 1 | por |
| oaire.citation.title | Microporous and Mesoporous Materials | por |
| oaire.citation.volume | 84 | por |
| person.familyName | Da Silva | |
| person.familyName | Lourenço | |
| person.givenName | José Paulo | |
| person.givenName | João P. | |
| person.identifier | 634248 | |
| person.identifier.ciencia-id | 3413-C4F4-73F7 | |
| person.identifier.ciencia-id | F81F-A1F0-2A7C | |
| person.identifier.orcid | 0000-0002-6458-7328 | |
| person.identifier.orcid | 0000-0002-0501-6672 | |
| person.identifier.rid | A-4606-2008 | |
| person.identifier.rid | A-7758-2008 | |
| person.identifier.scopus-author-id | 7201733236 | |
| person.identifier.scopus-author-id | 57195730600 | |
| rcaap.rights | restrictedAccess | por |
| rcaap.type | article | por |
| relation.isAuthorOfPublication | e2004fa2-a47d-44b0-b11c-fc95fe51cbf9 | |
| relation.isAuthorOfPublication | f66ab886-d989-4c1d-9550-527507723c26 | |
| relation.isAuthorOfPublication.latestForDiscovery | e2004fa2-a47d-44b0-b11c-fc95fe51cbf9 |