Electrical characterization of CVD diamond-n(+) silicon junctions

Rodrigues, A. M.; Gomes, Henrique L.; Stallinga, Peter; Pereira, L.; Pereira, E.

http://hdl.handle.net/10400.1/6592

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Resumo(s)

The electrical characteristics of CVD-diamond/n(+)-Si heterojunction devices are reported. Below 250 K the diodes show an unusual inversion of their rectification properties. This behavior is attributed to an enhanced tunneling component due to interface states, which change their occupation with the applied bias. The temperature dependence of the loss tangent shows two relaxation processes with different activation energies. These processes are likely related with two parallel charge transport mechanisms, one through the diamond grain, and the other through the grain boundary. (C) 2001 Elsevier Science B.V. Ah rights reserved.

URI

http://hdl.handle.net/10400.1/6592

Editora

Elsevier

DOI

https://dx.doi.org/10.1016/S0925-9635(00)00571-9

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FCT2-Artigos (em revistas ou actas indexadas)

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